The nB3 is a round-beam vector-scan system using a step-and-repeat method for nanopatterning and has been specially designed for mix-and-match lithography.

The innovative and modern design of the electron-optics and automation system enhances throughput and reliability, making the nB3 ideal for nano-device research and production. Its unique and compact vacuum structure ensures >95% uptime and robust operation.

The nB3 has a short column and a small footprint, and requires undemanding cleanroom conditions, including room temperature, stray-field, and floor vibration. This reduces the total cost of ownership.

Reliable, easy-to-use application software, and an extensible GUI, make the nB3 user friendly.

100nm Dot Optical Device Position error <3nm Roundness <5nm	50x30μm Logo Flexible writing strategy allows complex patterns	100nm T-gate on GaAs

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