NanoBeam has a worldwide customer base that is rapidly expanding. The NanoBeam lithography machine has been selected by a growing list of prestigious users for the development and production of next generation devices.

With its ease of use, the machine has excelled in multiuser research environments. Unrivalled reliability and low ownership costs have enabled the nB systems to provide the solution to low volume production of nano-devices.

  -  Centre for Advanced Photonics and Electronics at Cambridge University, UK
  -  Thales, France
  -  Nanjing Electronic Devices Institute, China
      -  Five systems have been installed and the sixth system will be installed in 2013
  -  Hebei Semiconductor Research Institute, China
      -  Three systems have been installed
  -  Institut d'Optique Graduate School, France
  -  Beijing University, China
      -  Second system to be installed in 2013
  -  INHA University, Korea
  -  UNIST University, Korea
  -  Hanyang University, Korea
  -  Exeter University, UK
  -  IEF, University of Paris, France
  -  Columbia University, USA
  -  The Institute of Microelectronics of the Chinese Academy of Sciences (IMECA), China 
      -  Second system to be installed in 2013