• Low Coulomb-effect Electron Optics
  • Unique auto-loading system
  • Advanced vibration tracking
  • Exceptional resistance to stray fields
  • Innovative TFE gun design
  • Reliable system software
  • High throughput
  • Small footprint
  • Low ownership cost
6nm lines
6nm lines
100nm T-gate
100nm T-gate
20nm Au & Pd metal lift-off lines
20nm Au & Pd metal lift-off lines
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NanoBeam nB4

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The nB3 is a generation ahead of the current competition and with its field-proven performance has gained acceptance in the market place. It has excellent stability and has demonstrated an average uptime of greater than 93%. NanoBeam now introduces the nB4 which has been developed to further reduce delivery times and service costs.



nB4 development aims:

  • Refine design and components to reduce routine service requirements.
  • Achieve a machine-fault-downtime of less than 5% annually.
  • Enhance performance
  • Facilitate volume production.

Specification comparison:

nB3

nB4

Beam Voltage range

30kV - 100kV

20kV - 100kV

Feature size on resist

<8nm

<8nm

Metal lift-off line width

20nm

20nm

Stitching/overlay error

<25nm for 500um field

<20nm for 500um field

 

 

Required regular service for

Average of 3 years

Expected

XY stage

2 years

> 5 years

optical column

6 years

> 10 years

loading robot

2 years

> 5 years

 

 

Gun plug for 100kV operation

Insulation fluid
required for > 95kV operation

Dry operation at 100kV


The nB4 system will provide a platform for further development to high deflection speed and further integrated electronics.